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| 020 | _a0521624606 (hardback) | ||
| 020 | _a0521785006 (pbk.) | ||
| 040 | _cCUS | ||
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_aQC176.83 _b.V46 2000 |
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_a530.4275 _221 _bVEN/I |
| 100 | 1 |
_aVenables, John, _d1936- _924953 |
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| 245 | 1 | 0 | _aIntroduction to surface and thin film processes |
| 260 |
_aCambrige, UK ; _aNew York : _bCambridge University Press, _c2000. |
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| 300 |
_axvi, 372 p. : _bill. ; _c26 cm. |
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| 505 | _a Preface; 1. Introduction to surface processes; 2. Surfaces in vacuum: ultra-high vacuum techniques and processes; 3. Electron-based techniques for examining surface and thin film processes; 4. Surface processes in adsorption; 5. Surface processes in epitaxial growth; 6. Electronic structure and emission processes at metallic surfaces; 7. Semiconductor surfaces and interfaces; 8. Surface processes in thin film devices; 9. Postscript: where do we go from here?; Appendices; References. | ||
| 650 | 0 |
_aThin films. _924954 |
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| 650 | 0 |
_aSurface chemistry. _96803 |
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| 942 |
_2ddc _cWB16 |
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