Introduction to surface and thin film processes/ John A. Venables.
Material type: TextPublication details: Cambrige, UK ; New York : Cambridge University Press, 2000Description: xvi, 372 p. : ill. ; 26 cmISBN: 0521785006 (pbk.)Subject(s): Thin films | Surface chemistryDDC classification: 530.4275Item type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
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General Books Science Library | Science Library, Sikkim University Science Library General Section | 530.4275 VEN/I (Browse shelf(Opens below)) | Available | Books For SU Science Library | P19602 |
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530.416 GRO/C Core level spectroscopy of solids/ | 530.416 GRU/D Density waves in solids/ | 530.4275 VEN/I Introduction to surface and thin film processes/ | 530.4275 VEN/I Introduction to surface and thin film processes/ | 530.429 KUM/L Liquid Crystals/ | 530.44 BAU/B Basic space plasma physics/ | 530.44 CHE/L Lecture notes on principles of plasma processing/ |
Includes bibliographical references (p. 331-361) and index.
1. Introduction to surface processes
2. Surfaces in vacuum: ultra-high vacuum techniques and processes
3. Electron-based techniques for examining surface and thin film processes
4. Surface processes in adsorption
5. Surface processes in epitaxial growth
6. Electronic structure and emission processes at metallic surfaces
7. Semiconductor surfaces and interfaces
8. Surface processes in thin film devices
9. Postscript: where do we go from here?
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