Lecture notes on principles of plasma processing/ (Record no. 164205)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 01362cam a22003014a 4500 |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 0306474972 |
| 040 ## - CATALOGING SOURCE | |
| Transcribing agency | CUS |
| 082 00 - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 530.44 |
| Item number | CHE/L |
| 100 1# - MAIN ENTRY--PERSONAL NAME | |
| Personal name | Chen, Francis F., |
| 245 10 - TITLE STATEMENT | |
| Title | Lecture notes on principles of plasma processing/ |
| Statement of responsibility, etc. | Francis F. Chen and Jane P. Chang. |
| 246 30 - VARYING FORM OF TITLE | |
| Title proper/short title | Principles of plasma processing |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
| Place of publication, distribution, etc. | New York : |
| Name of publisher, distributor, etc. | Kluwer Academic/Plenum Publishers, |
| Date of publication, distribution, etc. | 2003. |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | ix, 208 p. : |
| Other physical details | ill. ; |
| Dimensions | 28 cm. |
| 505 ## - FORMATTED CONTENTS NOTE | |
| Formatted contents note | Part A1: Introduction to Plasma Science. I. What is plasma? II.Plasma fundamentals.<br/>Part A2: Introduction to Gas Discharges. III. Gas discharge fundamentals.<br/>Part A3: Plasma Sources I. IV. Introduction to plasma sources.<br/>Part A4: Plasma Sources II. V. RIE discharges. Plasma Chemistry.<br/>Part A5: Plasma Sources III. VI. ECR sources.<br/>Part A6: Plasma Sources IV. VIII. Helicon wave sources and HDPs. IX. Discharge equilibrium.<br/>Part A7: Plasma Diagnostics. X. Introduction. XI. Remote diagnostics. Langmuir probes. XIII. Other local diagnostics.<br/><br/>Part B1: Overview of Plasma Processing in Microelectronics Fabrication. I. Plasma processing. II. Applications in microelectronics. Part B2: Kinetic Theory and Collisions. I. Kinetic theory. II. Practical gas kinetic models and macroscopic properties. III. Collision dynamics.<br/>Part B3: Atomic Collisions and Spectra. I. Atomic energy levels. II. Atomic collisions. IV. Inelastic collisions.<br/>Part B4: Molecular Collisions and Spectra. I. Molecular energy levels. II. Selection rule for optimal emission of molecules. IV Heavy particle collisions. V. Gas phase kinetics.<br/>Part B5: Plasma Diagnostics. I. Optical emission spectography. II. Laser induced fluorescence. III. Laser Interferometry. IV. Full-wafer interferometry. V. Mass spectrometry.<br/><br/>Part B6: Plasma Surface Kinetics. I. Plasma chemistry. II. Surface reactions. III. Loading. IV. Selectivity. V. Detailed reaction modeling. Part B7: Feature Evolution and Modeling. I. Fundamentals of feature evolution in plasma etching. II. Predictive modeling. III. Mechanisms of profile evolution. IV. Profile simulation. V. Plasma damage. Epilogue: Current Problems in Semiconductor Processing. I. Front-end challenges. II. Back-end challenges. III. Patterning nanometer features. IV. Deep reactive etch for MEMS. V. Plasma-induced damage. VI. Species control in plasma reactors. |
| 650 #0 - SUBJECT | |
| Keyword | Plasma engineering. |
| 650 #0 - SUBJECT | |
| Keyword | Plasma chemistry. |
| 650 #0 - SUBJECT | |
| Keyword | Plasma dynamics. |
| 700 1# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Chang, Jane P., |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | General Books Science Library |
| Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Shelving location | Date acquired | Full call number | Accession number | Date last seen | Koha item type | Public note |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Science Library, Sikkim University | Science Library, Sikkim University | Science Library General Section | 29/08/2016 | 530.44 CHE/L | P19117 | 16/01/2020 | General Books Science Library | Books For SU Science Library |